Charith K. Ranaweera

Charith K. Ranaweera is an experienced CMP Process Development Engineer at Headway Technologies since October 2021, with a substantial background in both research and engineering. Prior roles include serving as a Doctoral Researcher at Clarkson University from July 2017 to September 2021, focusing on chemical mechanical polishing (CMP) and post-CMP cleaning, and a CMP Process Engineer Graduate Intern at Intel Corporation for six months in early 2021. Charith's academic credentials include a PhD in Material Science and Engineering from Clarkson University, an MS in Polymer Chemistry from Pittsburg State University, and a BSc from the University of Sri Jayewardenepura. Research experience extends to synthesizing various nanostructured materials for supercapacitor applications and developing biodegradable compounds for consumer products.