AMD
Don Clay is a seasoned professional in the field of mask design, currently serving as a Sr. Staff Mask Layout Designer at Advanced Micro Devices, Inc. since 2005. Prior experience includes a role as a Mask Designer at Intel from November 2003 to January 2005, where responsibilities involved layout management and acting as a liaison to an external workforce agency. Additionally, Don worked at Digital Equipment Corporation from June 1993 to November 2003, managing recruiting and internal training for the mask design group and collaborating with local colleges to establish a layout-training program. Educational qualifications include an Associate degree in Electronics from Quinsigamond Community College, earned between 1993 and 1996.
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