Juno Lee is a Senior Director at Applied Materials Taiwan, specializing in module process engineering with expertise in SiGe:B, SiP, and Si CVD epitaxy processes. With over 10 years of experience in advanced foundry technology, Juno has contributed to PMOS device yield and productivity development, and has worked in both academic and semiconductor industry environments for over 6 years. Juno's previous roles include Director at Applied Materials and RD EPI Section Manager at TSMC, as well as a Visiting Scholar at the University of Illinois at Urbana-Champaign. Juno holds a Bachelor's degree in Physics from National Chung Hsing University and a PhD in Physics from National Tsing Hua University.
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