Leonid Belau, Ph.D., is a seasoned dry etch scientist with extensive experience in research and development within the semiconductor industry. Currently, they serve as a Process Engineer Director at Applied Materials, following a notable tenure as Technical Director at Lam Research, where they led advancements in dielectric dry etch processes for DRAM and Flash memory applications. Leonid's academic background includes a Ph.D. from The Hebrew University, and they have held postdoctoral research positions at prestigious institutions including UC Berkeley and Lawrence Berkeley National Laboratory. With a robust foundation in both physical and surface science, Leonid has contributed significantly to innovations in chemical and plasma cleaning technologies.
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