Alessandro Polo is a Senior Design Engineer at ASML, where they focus on wafer alignment sensors. They earned a Master's degree in Physics with cum laude from the University of Turin in 2008, after which they interned at Centro Ricerche Fiat, working on lighting design and light scattering research. They completed a PhD at TU Delft in 2014, specializing in adaptive optics for EUV lithography. Prior to their current role, they served as a Research Scientist at Science & Technology from 2014 to 2015.
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