Bart van Oerle is a seasoned professional in the field of applied physics with extensive experience in the semiconductor and optical components industries. Since March 2007, Bart has held leadership roles at ASML, where responsibilities include the development and integration of optical components in lithography machines. Prior to ASML, Bart served as a Senior Designer at Element Six from July 1999 to February 2007, focusing on the design and prototype manufacturing of optical components made from artificial diamond. Bart's academic background includes a PhD in Applied Physics from the University of Twente and an MSc in Experimental Physics from the University of Groningen, complemented by postdoctoral research at Technology Foundation STW on Laser Isotope Separation of Mercury.
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