Bert Vanpoucke

Bert Vanpoucke is a business architect currently employed at ASML, where they provide rapid diagnoses for complex technical issues related to the latest NXE lithography machines and lead technical escalations as necessary. Specializing in the optical properties of EUV light and system dynamics, Bert works to enhance knowledge on the production floor and improve diagnostic documentation and tools. They completed a bachelor's degree in Physics with honors at KU Leuven and graduated magna cum laude from the Erasmus Mundus Master in Nanotechnology at Chalmers University. Bert's early experience includes a summer internship at CERN, where they focused on lattice determination of impurities in semiconductors.