Brandon Pelc is a Lithography System Performance Architect at ASML, where they currently serve as a Senior Integration Engineer III in the Droplet Generation team. They have extensive experience in integrating and developing hardware and software for Extreme Ultraviolet (EUV) Lithography machines and troubleshooting issues related to droplet generation. Brandon's previous roles at ASML include EUV Prototype Engineer and Lead/EUV Prototype Engineer, where they provided leadership and engaged with project stakeholders to enhance system performance. They hold a Bachelor's degree in Nuclear, Plasma, and Radiological Engineering from the University of Illinois at Urbana-Champaign.
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