Charles Rozeski is an Applications Engineer at ASML, specializing in overlay and metrology optimization for Extreme Ultraviolet (EUV) photolithography. They previously held internship positions at ASML, focusing on customer use cases and developing training materials for metrology systems. Charles also gained experience as a SVD Applications Intern at Edwards Vacuum and serves as an Electrical System Technician in the U.S. Air Force Reserve. They are pursuing a Bachelor of Science degree in Electrical and Electronics Engineering at the University at Buffalo, expected to graduate in 2025.
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