Cheuk-Wah Man is an IC Imaging Integrator at ASML, where they have contributed since 2005, bringing over 20 years of experience in EUV lithography. Currently, they lead the verification and validation of imaging performance for NXE and EXE scanner platforms, ensuring high-level planning and progress reporting to stakeholders. Previously, they held roles ranging from Design Engineer to Senior Design Engineer, focusing on imaging tests and EUV simulations for various scanner models. Cheuk-Wah is pursuing a Drs in Physics at Vrije Universiteit Amsterdam.
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