Christian Cloin is a Principal Architect at ASML, specializing in defectivity. They hold a Master's degree in Physics from Technische Universiteit Eindhoven and a Bachelor's degree in Physics from Fontys Hogeschool Eindhoven. Christian's career includes roles as an R&D engineer at McKey Services BV, an Assistant System Engineer at ASML, and multiple architect positions, leading development efforts in EUV technology and immersion lithography machines, resulting in numerous patents. Christian has also contributed to projects at Xtreme Technologies GmbH, enhancing the stability and power output of EUV light source technology.
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