Erwin Maas is a seasoned software architect with extensive experience in the lithography industry. Since June 2006, Maas has been with ASML, initially serving as a Physics Design Engineer, where machine control software for lithography systems was developed, and currently in the role of Software Architect, focusing on software design to optimize image quality. Previous roles include Adviser at OOG.VOOR.LEZEN, contributing to the development and application of eye-tracking technology, and Manager R&D and Software Engineer at Verify B.V. Erwin Maas holds an MSc in IT from the University of Liverpool and a Drs in Physics from Utrecht University.
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