Ewa Kasperkiewicz has a diverse background in optical and lighting design, with experience spanning several key positions in renowned companies. Ewa interned as a Lighting Designer at Luxon LED and simultaneously completed internships at the Institute of Applied Optics and the Institute of Applied Physics, focusing on optical system design. Ewa also served as a Corporate Research & Technology Intern at ZEISS Group and worked on a Master Thesis at Mahr GmbH. From April 2018 to April 2022, Ewa advanced through roles at ASML, starting as a Lithography System Performance Engineer and later becoming a Senior On Product Performance Overlay Engineer. Ewa holds a Bachelor of Science from Politechnika Wrocławska and a Master of Science from Friedrich-Schiller-Universität Jena.
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