Fangfang Wen

Fangfang Wen, Ph.D., is a forensics architect at ASML, specializing in photolithography process development for next-generation memory chips. They possess extensive experience in nanofabrication processes, including e-beam lithography, photolithography, PECVD, and dry etching. Previously, Fangfang held positions at Micron Technology, where they contributed to R&D in photolithography process development, and conducted advanced research as a Graduate Research Assistant at Rice University. Fangfang earned a Doctor of Philosophy (Ph.D.) in Nanophotonics from Rice University, following a Master of Science in the same field from École Normale Supérieure de Cachan.