Han Xia is currently working at ASML in the EUV source business line, focusing on the integration of next-generation EUV lithography technology for microchip production. Previously, they held various roles at ASML, including System Industrialization Architect and Plasma and Laser Physics Engineer, where they specialized in EUV source performance, diagnostic architecture, and machine learning applications for troubleshooting. Han's educational background includes a PhD from Delft University of Technology, along with a Master's from the Technical University of Clausthal and a Bachelor's from Huazhong University of Science and Technology. Their early experience features internships in automatic control technologies and mechanical engineering in China and work as a Student Assistant at the Laser Application Centre in Germany.
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