James Yang is currently a principal architect at ASML, specializing in the architecture of the Environment Control and Infrastructure for advanced EUV lithography machines. They have driven the architecture and implementation of two generations of EUV sources, significantly impacting high-volume semiconductor production. Prior to ASML, James held various roles including gas and vacuum system architect and senior process development engineer. They also served as the chairman of VCWI and were a visiting scientist at the University of Amsterdam. In their spare time, James works as a color and style consultant for Qianhui Image Design studio.
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