Jeffry Bulson is a Senior Vacuum Systems Architect at ASML, specializing in vacuum systems and gas flow development for extreme ultraviolet (EUV) lithography scanners. With a background in experimental physics and electrical engineering, they have extensive experience in diverse industries, including defense contracting, consulting, and academia. Previous roles include Senior Scientist at MOE Medical Devices, LLC, and Senior Research Scientist at Panasonic USA, where they focused on plasma technologies and thin-film research. Jeffry holds an M.S. in Physics from the University of Iowa and a B.S. in Physics from Siena University.
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