Joerg Mallmann is a Senior Director of Product Development for EUV High NA at ASML, where they oversee the development and introduction of advanced metrology tools and the latest EUV platforms. With a background that includes roles such as R&D Lithography Engineer at Naomi Mainz and Litho Process Engineer at IBM, Joerg has extensive experience in lithography and imaging technologies. They have also held leadership positions at Zeiss and Orbotech, demonstrating a strong track record in managing innovative product development teams and projects.
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