Joost Rooze is a wafer alignment research architect at ASML. They previously held roles in the company as a system engineer focusing on on-product overlay and as an overlay engineer, where they investigated and improved overlay-related aspects of immersion lithography scanners. Earlier in their career, Joost worked as a researcher at ETD&C bv, modeling a novel water-softening technology. Joost earned a PhD in cavitation in gas-saturated liquids from Technische Universiteit Eindhoven and holds a degree in chemical engineering from Eindhoven University of Technology.
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