Kees Feenstra is a seasoned professional currently serving as Group Leader of Vacuum Architecture at ASML in the Machine Conditioning/EUV Scanner department. Previously, Kees held significant roles at ASML, including Project Leader for EUV Source Technology and Group Leader overseeing EUV applications. Earlier in their career, Kees was a Principal Process Engineer in Lithography at Philips Semiconductors and worked as an Applications Engineer at KLA-Tencor Ltd. Kees earned a Ph.D. in Thin Film Photovoltaic Solar Cells from Utrecht University and holds an Ir. in Applied Physics from the University of Twente.
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