Kramer Harrison is a senior optical engineer with over a decade of experience in advanced photolithography systems, currently serving as the EUV optical design and modeling competence lead at ASML. Harrison's background includes a Master of Science in Optics/Optical Sciences from the University of Rochester and a Bachelor of Science in Physics/Mathematics from the University of Oklahoma. Previous roles have included senior optical design engineer and senior R&D engineer, with a focus on EUV source design and next-generation photolithography systems. Harrison is also passionate about applying machine learning in optics, and in their spare time, maintains an open-source Python package for optical design while enjoying hobby electronics, programming, traveling, and playing guitar.
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