Kyungil Kim is a seasoned professional in metrology and condensed matter physics with extensive experience in both academic and industrial settings. Currently serving as a Senior Metrology Architect Engineer at ASML since June 2018, Kyungil Kim has contributed significantly to EUV plasma metrology, particularly in the development and optimization of the Droplet Illumination and Detection Module. Prior experience includes roles as a Postdoctoral Scholar at the University of Chicago, focusing on synchrotron X-ray scattering, and a Senior Integration Engineer at Cymer, where responsibilities involved managing and testing EUV photolithography light sources. Educational qualifications include a Bachelor of Science and a Master of Science from Seoul National University, followed by a Ph.D. from Northwestern University, emphasizing experimental condensed matter physics.
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