Luigi Scaccabarozzi

Luigi Scaccabarozzi possesses extensive experience in applied physics and engineering, including significant roles at ASML, where contributions spanned from system engineering to senior architect positions, focusing on next-generation EUV sources and lithography technology. Key responsibilities included leading the EUV mask contamination projects, technical leadership in defining source system architecture, and supervising research initiatives, while also engaging in novel EUV mask inspection techniques presented at international conferences. Prior experience includes a research assistant position at Stanford University, where Luigi developed innovative optical devices. Educational qualifications include a Laurea in Nuclear Engineering from Politecnico di Milano, a PhD in Applied Physics from Stanford University, and a Diplome in Physics from CentraleSupélec.