Luuk Heijmans is currently the EUV-Induced Plasma Competence Lead at ASML, overseeing activities related to EUV-induced plasma in lithography tools. They earned a PhD in Applied Physics from Eindhoven University of Technology, where their research focused on the influence of plasma and flow on dust particles. Additionally, Luuk served as Secretary for the alumni association "VENI" and held various positions at reputable organizations, including internships at Eindhoven University of Technology and the University of Tromsø. They also contributed to the financial management of the study association for applied physics "J.D. van der Waals" as Treasurer.
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