Marc Boonman is currently the Director of Development & Engineering for Machine Conditioning EUV Scanners at ASML, having held various leadership roles within the company since 2000. They previously served as the Director of Development & Engineering for DUV System Performance from 2018 to 2020 and have extensive experience in managing development and engineering teams focused on optical systems and conditioning. Marc earned a PhD in Physics from the University of Nijmegen and holds an Ir. degree in Physics from Delft University of Technology. Additionally, they are a steward and board member for KNAF, overseeing safety portfolio matters.
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