Peter Nikolsky is a highly experienced professional in imaging and photolithography, currently serving as Team Lead and Principal Architect at ASML since October 2005. With expertise in Critical Dimension Uniformity (CDU), scanner-to-scanner CD mismatch, and other imaging metrics, Peter has led teams in developing methodologies, optimizing processes, and providing customer support for EUV and ArFi lithography. Prior to ASML, Peter worked as a Staff R&D Engineer at Tower Semiconductor and as a Senior Expert Chemist at Krasnoyarsk State Technological Academy, focusing on photolithography development and analytical methods. Peter holds an MSc in Chemistry and Physics from Сибирский федеральный университет and has a strong background in engineering and research within the semiconductor industry.
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