Roman Pushkarev is an experienced technical leader in the semiconductor industry, currently serving as an Architect at ASML, where they ensure roadmap solutions and field performance of EUV scanner optics. They previously held the position of Design Engineer at ASML and contributed as a Postdoctoral Researcher at the University of Twente, where they patented a solution to enhance EUV pellicle lifetime. Roman earned a Master's degree in Materials Chemistry from Novosibirsk State University and a PhD in Materials Science from the Nikolaev Institute of Inorganic Chemistry.
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