Ruben Maas is a highly experienced project lead and architect at ASML since December 2015, specializing in the Computational Litho+ project, which leverages numerical models to analyze semiconductor manufacturing processes and their effects on lithography. Prior to this role, Ruben served as a research scientist, focusing on photoresist exposure dynamics in extreme ultraviolet lithography. Ruben's research background includes a postdoctoral position and PhD research at AMOLF, where work was conducted in the Photonic Materials group under Prof. Albert Polman. Additionally, Ruben contributed as a teaching assistant at Universiteit Utrecht. Ruben holds a Master's Degree and a Bachelor's Degree in Physics from Utrecht University, obtained in 2011 and 2009, respectively.
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