Shuo Zhao

Shuo Zhao is a highly skilled professional in the field of electron optics and lithography, currently serving as a Principal Electron-Optics Architect at ASML since January 2019. Previously, Shuo held the position of Principal Engineer at GLOBALFOUNDRIES, where significant contributions included developing an EUV lithography process for the 7nm technology node chip, achieving critical dimension control with a Cp value exceeding 2. Other roles at GLOBALFOUNDRIES involved simulating the impacts of defects in EUV reticles and proposing independent repair strategies. Shuo's academic background includes a Ph.D. in Electrical Engineering with a focus on Optical Engineering from Penn State University, along with a Master's in Microelectronics and a Bachelor's in Electronic Engineering from Tsinghua University. Additionally, Shuo has experience as a Teaching Assistant at Penn State University and an intern at Thorlabs, where innovative methods for assessing spatial light modulator performance were developed.