Stanislas Baron has extensive experience in the semiconductor industry, currently serving as the Head of Metrology and Patterning Control (MPC) at ASML since January 2006. Throughout this tenure, Stanislas has held key leadership positions, including Brion General Manager, Senior Director of PWE Product Engineering, and Senior Director of OPC and Platform Product Engineering, overseeing various product engineering groups and marketing efforts. Previously, Stanislas worked as a Corporate Application Engineer at ST Microelectronics from January 2004 to January 2006, specializing in advanced mask engineering. Stanislas holds a Master's degree in Physics, Electronics, and Information Technologies from ECAM Rennes, completed from 2001 to 2003, and furthered education at IMD from 2014 to 2016.
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