Takane Usui

Takane Usui is a senior architect at ASML, specializing in the development of the Reticle Stage module for next-generation Extreme UV lithography systems. With a Ph.D. in Mechanical Engineering from Stanford University, Takane has extensive experience in materials science, having previously held research and leadership roles at Stanford University, BASF, and COMSOL, Inc. Takane’s expertise encompasses advanced materials characterization and process engineering, where they have successfully led teams on significant research projects with substantial funding. Their technical leadership and stakeholder management skills are complemented by a strong academic background, including a B.S. from UCLA and multiple degrees from Stanford University.