Tom Wilms

Tom Wilms is a professional with extensive experience in the field of applied physics, particularly in the semiconductor industry. With a Master of Science degree from Eindhoven University of Technology, Tom began as a Research Intern at SKF and Philips from August 2011 to October 2012. Tom later joined ASML in April 2018, where roles included Project Lead for the EUV Source CO2 Laser team, Architect for the EUV optical column, and System Engineer for EUV systems. As a Design Engineer, Tom was responsible for developing dose control algorithms for EUV scanners and optimizing control strategies for EUV sources, contributing to significant advancements in calibrating and enhancing performance software.