Michael May is an experienced professional in the field of lithography and photonics, currently serving as the Head of Laboratory at CEA-Leti since May 2025. With a comprehensive career at CEA, including roles as a Photolithography Process Engineer and Head of Lithography Laboratory, Michael has a strong background in process engineering, notably in the semiconductor industry. Previous experience includes positions at TRONICS Microsystems and IBM, focusing on lithography process development and defect reduction. Michael holds a PhD in 193nm positive and negative tone resist characterization from STMicroelectronics/CEA and has completed advanced degrees in polymer chemistry from Institut Charles Sadron and ECPM.
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