Allen Gabor is an IBM Distinguished Engineer and Chief Patterning Engineer for IBM Semiconductors, where they drive innovation in advanced lithography and patterning for next-generation semiconductor technologies. They have a proven track record of technical leadership from 90 nm to 2 nm nodes, focusing on bridging deep technical expertise with strategic execution. With experience in technology process development, design-for-manufacturability, and EUV insertion, they emphasize edge-placement-error minimization and program leadership. Allen has authored over 50 journal papers and holds more than 40 patents, reflecting their strong foundation in structured problem-solving and risk management. They hold a Ph.D. in Materials Science and Engineering from Cornell University and serve on the SPIE EUV Lithography Conference program committee as a senior member.
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