Philippe Leray is a metrology engineer currently serving as the Director of the Advanced Patterning department and Group Leader for Litho Process and Pattern Control at imec, where they lead a team focused on advanced lithography and metrology development. They have previously held roles at IMEC since 2001, overseeing projects related to overlay metrology and scatterometry, and worked as a project manager on EU initiatives such as SOCOT and OCSLI. Philippe earned a PhD in Plasma Physics from Paris-Sud University (Paris XI) and completed a postdoctoral fellowship at the European Joint Research Center in Ispra from 1998 to 2001.
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