Ashok Rajamani possesses extensive experience in the field of materials science and engineering, with a strong background in thin films and deposition technologies. At Intel Corporation, roles have included Staff Engineer and Hiring Manager, Group Leader, Engineering Department Manager, and Senior Process Engineer, with significant contributions to technical issue resolution and innovative system development in the Thin Films Dielectrics area. Achievements include leading teams in high-volume production ramps and reducing film thickness non-uniformity through design improvements. Further expertise was gained as a Postdoctoral Researcher at the Massachusetts Institute of Technology, focusing on magneto-optic materials. Currently, Ashok serves as Technology Development Manager at Intel, overseeing an ALD group dedicated to solutions for advanced lithography. Educational credentials include a BTech in Metallurgical Engineering from the Indian Institute of Technology (Banaras Hindu University) and a PhD in Materials Science and Engineering from Brown University.
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