Cheyun Lin is a leading tech expert in dielectric materials at Intel Corporation, with 12 years of experience in the semiconductor industry. They have made significant contributions as a key player in Intel’s SuperFin technology, which yielded the largest intra-node performance gain in the company's history, earning them the Intel Achievement Award. Cheyun also worked as a Graduate Research Assistant at The University of Texas at Austin, where they investigated silicon nanophotonic devices, and completed an internship at Nan Ya Plastics Corporation focusing on LCD polarizers. Cheyun holds a Master's degree in Electrical and Systems Engineering from The University of Pennsylvania and completed their Ph.D. studies at The University of Texas at Austin.
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