Manish Sharma is currently a Principal Engineer and TD Manager in the Yield Organization at Intel Corporation, where they lead inline defect metrology development to address yield limiters for upcoming technology nodes. Previously, from 2008 to 2015, Manish served as a Senior Yield Engineer at Intel, focusing on semiconductor process development to eliminate yield-limiting marginalities. Manish earned a Doctor of Philosophy in Chemical Engineering and Electronic Materials from Cornell University in 2007 and holds a Bachelor of Technology in Chemical Engineering from IIT Delhi, completed in 2001.
This person is not in the org chart
This person is not in any teams
This person is not in any offices