Rahul Ramaswamy is a semiconductor technologist with 9 years of experience specializing in foundry process integration, silicon reliability, and product development. They have led process definition and development for advanced FinFET technologies at Intel Corporation, where they currently serve as a Senior Staff Process Integration and Yield Development Engineer. Rahul's academic background includes a Ph.D. in Electrical Engineering from the University at Buffalo, focusing on Gallium nitrides and Gallium arsenide, as well as a Master of Science in Electrical and Electronics Engineering from the same institution. Additionally, they have contributed to teaching and research while at the University at Buffalo, exploring electron transport mechanisms in III-V semiconductors.
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