Lieve Teugels is a CMP Process Engineer at Meta since February 2022, with prior extensive experience in research and development roles. Previously, Lieve served as an R&D Engineer CMP at IMEC from November 2009 to January 2022, focusing on advanced CMP applications. Earlier in the career, Lieve worked as a Research Assistant at the University of Chicago from June 2003 to September 2009, conducting experiments on self-assembly structures and honing expertise in surface analysis techniques. Lieve also held a position as a Teaching Assistant at the University of Chicago, where responsibilities included leading student sections and evaluating lab reports. Education includes a Ph.D. and M.S. in Chemistry from the University of Chicago, and a Licentiaat in Scheikunde from KU Leuven.
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