Meitar Katz is an experienced engineer with a strong background in process engineering and metrology. At Intel Corporation, Meitar served as a Process Engineer from August 2018 to June 2021, specializing in Wet Etch Engineering, focusing on tool and layer performance, daily sustaining, and defect performance. Prior experience includes work with the Israeli Air Force from 2013 to 2015, where Meitar generated complex grids for computational fluid dynamics (CFD) and developed meshing proficiency. Currently, as a Metrology Engineer at Meta since November 2022, Meitar executes image quality and optical performance testing and has developed Standard Operating Procedures for custom optical metrology tools. Meitar holds two Bachelor of Science degrees from Tel Aviv University in Chemistry and Materials Science and Engineering, earned from 2015 to 2020.
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