Benjamin Moser is a seasoned engineer with extensive experience in semiconductor process development, having held positions at prominent companies such as ASML, Intel, and Texas Instruments. With a background in physics from Rutgers University and advanced electronics training from the U.S. Navy, Benjamin has led cross-functional teams to drive defect reductions, improve process control, and implement innovative solutions in high-tech manufacturing environments. Recognized for outstanding leadership and results orientation, Benjamin has won multiple awards for contributions to yield improvement and process enhancements. Currently, Benjamin serves as a Senior Process Engineer at Micron Technology, continuing to advance semiconductor technologies.
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