Collin Howder is a physical chemist, process engineer, and inventor specializing in chemical etching applications for NAND flash semiconductor devices. They have held various positions at Micron Technology, including Principal Engineer and Senior Process Development Engineer, where they focused on advanced processes such as hardmask removal and silicon nitride removal. Collin obtained a BA in Chemistry from Spring Arbor University, graduating summa cum laude, and a Ph.D. in Physical Chemistry from the University of Utah. Additionally, they have conducted significant research in both academic and industrial settings, contributing to advancements in nanoparticle analysis and materials characterization.
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