Dong Liang

Dong Liang is a Principal Process Development Engineer at Micron Technology with a solid foundation in semiconductor device physics and processing. They have seven years of hands-on experience in semiconductor processing for nanodevice fabrication and have led over ten research projects, collaborating with multiple research groups. Dong has published over 20 high-impact peer-reviewed papers and demonstrated strong problem-solving and communication skills throughout their career, which includes significant roles at the University of Wisconsin-Madison and Case Western Reserve University. They hold a Ph.D. in Physics from Case Western Reserve University and a Master’s degree in Optoelectronics from Tianjin University.