Patsy Hayes Hamilton

Sr ATE Dry Etch Process Engineer

Patsy Hayes Hamilton is a Process Engineer at Micron Technology, with over six years of experience previously at Intel Corporation. At Intel, they monitored and improved wafer fabrication processes, achieving Level 2 Process certifications and leading significant cost-savings initiatives. They supported technology transfers to high volume manufacturing and collaborated with cross-functional teams to enhance semiconductor manufacturing operations. Patsy also gained research experience at Rochester Institute of Technology, where they assisted in the development of organic photovoltaic devices and served as a tutor in mathematics and physics.

Location

Manassas, United States


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