Rokib Islam

Rokib Islam has extensive experience in process R&D engineering, currently serving as a Principal Process R&D Engineer DRAM at Micron Technology since November 2016. Key contributions include advancing STI etch development and creating etches for novel patterning schemes using EUV lithography. Previously, as a Senior Process R&D Engineer for NAND, Rokib developed etches for Micron's groundbreaking 232L NAND technology and drove innovation in new etch technologies. Prior to Micron, Rokib worked as a Research Assistant at Washington State University, where contributions included the development of weakly ionized plasmas and teaching undergraduate courses. With a Ph.D. in Electrical Engineering from Washington State University, along with an MS and BS from Islamic University of Technology, Rokib holds a solid educational foundation complemented by practical teaching experience.