John Hoffnagle is a seasoned Research Scientist at Picarro, Inc. since February 2010, specializing in advanced research methodologies. Prior to this role, John served as a Research Staff Member at IBM Almaden Research Center from November 1985 to March 2009, where contributions were made in the fields of interferometric lithography, laser beam shaping, holographic data storage, and nonlinear dynamics of electrodynamically trapped ions. Additionally, John worked as Scientific Staff at ETH Zurich from February 1982 to October 1985, focusing on ultra-sensitive atomic spectroscopy and nonlinear optics. John Hoffnagle holds a Doktor der Naturwissenschaften in Physics from ETH Zürich (1978-1982), as well as a B.S. in Physics from Yale University (1971-1975) and further studies at the University of Chicago (1975-1978).
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