Based in Europe since it was founded in 2002, Siconnex is a global equipment manufacturer of wet chemistry equipment for the semiconductor sector and related industries. We supply BATCHSPRAY® equipment for the surface preparation of various end products such as MEMS, power semiconductors, analogue/mixed signal semiconductors, III-V semiconductors and many more besides. Our equipment is market-leading thanks to its safety, automation, small equipment footprint, high throughput and low consumption of economic resources.

Our innovative BATCHSPRAY® technology is based on a closed system, in which chemical-based cleaning and etching processes are performed highly efficiently. Various chemical processes, including rinsing and drying, are performed fully automatically in a process chamber. The process chamber can be designed for one carrier with 25 wafers or two carriers with 50 wafers to suit your needs. Thanks to our autoload equipment, up to four chambers can be loaded simultaneously to enable throughputs of up to 400 wafers per hour.

Semiconductor

Siconnex

Petra Reichel

Michaela Hiesel

Christoph Unterberger

Wolfgang Mösenbichler

David Neunteufel

Daniel Oberascher

Fabio Wörndl

The Engineering team at Siconnex is responsible for the design, development, and optimization of advanced wet chemistry equipment tailored for the semiconductor industry. This team collaborates on mechanical, software, and process engineering to enhance the efficiency, safety, and performance of the innovative BATCHSPRAY® technology. Their expertise ensures that products meet market-leading standards while addressing customer needs for high throughput and resource efficiency.

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