Alon Kosloff is an experienced Device Physicist at TriEye, a position held since May 2019. Prior to this role, Alon Kosloff worked at the Tel Aviv University Nano Center from January 2014 to May 2019 as an e-beam lithography guide, assisting and guiding researchers in the development of electron beam lithography processes. Alon Kosloff also completed a Ph.D. in Nano Technology at Tel Aviv University between February 2012 and May 2019. Education includes a Master’s Degree in Chemistry obtained from Tel Aviv University in 2013 and a Bachelor’s Degree in Chemistry from 2011.
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