Henry Hsieh is a Principal Process Engineer at TSMC, specializing in N5/N3 barrier seed process mass production transfer since 2019. They previously served as a Senior Research and Development Engineer at AUO, focusing on Mono PERC solar cell R&D from 2016 to 2019. Henry graduated with a Bachelor's degree in Chemical and Materials Engineering and a Doctorate in the same field from National Central University, where they explored semiconductor materials and discovered a unique negative differential resistance phenomenon in tin oxide thin film, which formed the basis of their doctoral dissertation.
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